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OALib Journal期刊
ISSN: 2333-9721
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STUDY OF THE RELATION BETWEEN INTERFACIAL REACTION AND FORMATION OF SCHOTTKY BARRIERS
Pt/Si界面反应与肖特基势垒形成的研究

Keywords: interfacial reaction,Schottky barrier,deep level,silicide
界面反应
,肖特基势垒,硅化物,

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Abstract:

Electrical measurements (DLTS and C-V) were combined with surface analysis techniques (AES and SIMS) to study the reactions, atomic structure, the distribution of defect/impurity and the Schottky barrier heights at Pt/Si and Pt-silicides/Si interfaces. The relation between the interracial reaction and the formation of Schottky barriers is discussed in this paper in detail.

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