POLYSTYRENE-SULFONE DEGRADATION AND EXTRUSION OF SO_2 FROM DIBENZYL SULFONE PHOTOSENSITIZED BY TETRAMETHYLBENZIDINE
四甲基对联苯二胺光敏化聚苯乙烯砜及其模型化合物二苄基砜分解机理的研究

N, N, N', N'-tetramethylbenzidine (NTMB) and 3, 3' 5, 5'-tetramethylbenzidine (TMB) photosensitize the extrusion of SO2 from dibenzyl sulfone (DBS) and degradation of polystyrene-sulfone (PSS). .Both singlet and triplet sensitization are observed. An electron transfer mechanism is proposed to explain the results. The efficiency of triplet sensitization is much higher than that of singlet sensitization.