%0 Journal Article
%T POLYSTYRENE-SULFONE DEGRADATION AND EXTRUSION OF SO_2 FROM DIBENZYL SULFONE PHOTOSENSITIZED BY TETRAMETHYLBENZIDINE<br>四甲基对联苯二胺光敏化聚苯乙烯砜及其模型化合物二苄基砜分解机理的研究
%A TONG Zhen-he
%A YANG Yong-yuan
%A MENG Xian-juan
%A FENG Shu-jing
%A GAO Zhi-min
%A <br>佟振合
%A 杨永源
%A 孟宪娟
%A 冯树京
%A 高志民
%J 高分子学报
%D 1988
%I 
%X N, N, N', N'-tetramethylbenzidine (NTMB) and 3, 3' 5, 5'-tetramethylbenzidine (TMB) photosensitize the extrusion of SO2 from dibenzyl sulfone (DBS) and degradation of polystyrene-sulfone (PSS). .Both singlet and triplet sensitization are observed. An electron transfer mechanism is proposed to explain the results. The efficiency of triplet sensitization is much higher than that of singlet sensitization.
%K Reversible electron transfer photosensitization
%K Degradation of polystyrene-sulfone
%K Tetramethylbenzidine as phosensitizer
%K Quantum yield of photosensitized reaction
%K Radical ion pair<br>电子转移光敏化
%K 聚苯乙烯砜降解
%K 四甲基对联苯二胺敏化剂
%K 敏化量子产率
%K 离子自由基对
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=6579068328FE643F&jid=15971983683C7643EE80F1CE621DEB60&aid=AD8DFF2B7154836C&yid=0702FE8EC3581E51&iid=38B194292C032A66&sid=527AEE9F3446633A&eid=AD16A18DBD734D13&journal_id=1000-3304&journal_name=高分子学报&referenced_num=0&reference_num=0