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OALib Journal期刊
ISSN: 2333-9721
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Fabrication and Characterization of General Microcups with Flexibility and Solvent-resistance by UV Photo-mask Lithography
掩膜光刻法制备柔性抗蚀电子纸微杯及其性能表征

Keywords: photo-mask lithography,flexibility,solvent resistance,microcup,electronic paper
掩膜光刻
,柔性,抗蚀性,电子纸,微杯

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Abstract:

To develop a simple low-cost method for general microcups of electronic paper,the chosen methacrylic ester formulation consisted of some function units,such as solvent-resistance units,flexibility and adhesion promoting units,was accomplished through photo-mask lithography.The solvent-resistance units were the compact network structure obtained by crosslinked oligomers with carboxylic acid.Furthermore,the flexibility and adhesion promoting units were flexible materials obtained by polyester,urethane,isoborn...

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