%0 Journal Article
%T Fabrication and Characterization of General Microcups with Flexibility and Solvent-resistance by UV Photo-mask Lithography<br>掩膜光刻法制备柔性抗蚀电子纸微杯及其性能表征
%A WANG Jian
%A MENG Xian-wei
%A TANG Fang-qiong
%A REN Xiang-ling
%A REN Jun
%A ZHANG Lin
%A <br>王健
%A 孟宪伟
%A 唐芳琼
%A 任湘菱
%A 任俊
%A 张琳
%J 过程工程学报
%D 2009
%I 
%X To develop a simple low-cost method for general microcups of electronic paper,the chosen methacrylic ester formulation consisted of some function units,such as solvent-resistance units,flexibility and adhesion promoting units,was accomplished through photo-mask lithography.The solvent-resistance units were the compact network structure obtained by crosslinked oligomers with carboxylic acid.Furthermore,the flexibility and adhesion promoting units were flexible materials obtained by polyester,urethane,isoborn...
%K photo-mask lithography
%K flexibility
%K solvent resistance
%K microcup
%K electronic paper<br>掩膜光刻
%K 柔性
%K 抗蚀性
%K 电子纸
%K 微杯
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=3FCF8B1A330466D5&jid=B9EE12934D19905403D996AE65CEEEED&aid=88CE161BA2A90BAB76D7C34FFFE51037&yid=DE12191FBD62783C&vid=9CF7A0430CBB2DFD&iid=E158A972A605785F&sid=FCB110411B6339D8&eid=F2947E14627CD734&journal_id=1009-606X&journal_name=过程工程学报&referenced_num=1&reference_num=19