The Application of Genetic Algorithm in Thin Film Characters Measurement
遗传算法在薄膜特性参量测量中的应用

By using Genetc Algorithm(GA), global optimization model was constructed, in which optical constans are measured as parameters. Results were optimized by using genetic and aberrance iterative calculations. The damage of samples which is indeed by contact measurement is avoided. This method is simple and have good stabilization with high accuracy. During experiment the one-layer ideal model error is less than 1 nm, and the real model error according to atomic profiler is less than 20 nm.