Fabrication of Infrared Microlens Array Using Atomic Force Microscope
原子力显微镜加工红外微透镜阵列的研究

Infrared microlens array on the substrate of Si,Ge,and GaAs fabricated with atomic force microscope gray scale anodic oxidation was presented.A 3×3 infrared silicon micro-lens array was fabricated using this method.The repeatability errors of the height and surface diameter of the nine microlens respectively were 0.2 nm and 6.0nm.The average curvature radius of the microlens was 510.8 nm.The causes of surface figure errors of infrared microlens fabricated with atomic force microscope anodic oxidation were studied and the methods of reducing surface figure errors were put forward.Refractive,diffractive and hybrid infrared microlens arrays fabricated with this approach can be developed to further reduce the size of infrared imaging system.