Imaging Model for DMD-Based Gray-tone Lithography System
基于数字微反射镜灰度光刻的成像模型

The characteristic of the gray-tone pattern generate d by DMD is discussed and an imaging model for describing the digital gray-tone lithography process is developed. In addition, the effects of DMD operation mod e and the parameters of imaging system to the distribution of the exposure dose on the photoresist are simulated and discussed.The model will be helpful for th e experimental research on the digital lithography.