%0 Journal Article
%T Imaging Model for DMD-Based Gray-tone Lithography System<br>基于数字微反射镜灰度光刻的成像模型
%A Institute of Information Optics
%A Sichuan University
%A Chengdu Institute of Optics
%A Electronics
%A Chinese Academy of Sciences
%A Chengdu
%A <br>郭小伟
%A 杜惊雷 罗铂靓
%A 郭永康
%A 杜春雷
%J 光子学报
%D 2006
%I 
%X The characteristic of the gray-tone pattern generate d by DMD is discussed and an imaging model for describing the digital gray-tone lithography process is developed. In addition, the effects of DMD operation mod e and the parameters of imaging system to the distribution of the exposure dose on the photoresist are simulated and discussed.The model will be helpful for th e experimental research on the digital lithography.
%K Digital gray-tone lithography
%K DMD
%K Imaging model
%K Exposure dose<br>数字灰度光刻
%K DMD
%K 成像模型
%K 曝光量
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=9F6139E34DAA109F9C104697BF49FC39&aid=C8BA540D99A4B017&yid=37904DC365DD7266&vid=6209D9E8050195F5&iid=9CF7A0430CBB2DFD&sid=0FA5E3FF9DF9A6BA&eid=B240D359488D2362&journal_id=1004-4213&journal_name=光子学报&referenced_num=8&reference_num=17