A Fiber Grating Etching Method With Small Tunable Range of Grating Wavelength Employing Phase Mask
一种利用相位掩模版对光栅波长进行微调的光栅刻写方法

A fiber grating etching method, which can protect phase mask from abrasion and make the grating wavelength tunable in a small range, has been proposed and demonstrated. A tunable range of 0.48 nm and 2.2 nm in 1 550 nm single-mode fiber and erbium-doped fiber respectively have been demonstrated through tuning the distance between fiber and phase mask. When the distance between phase mask and fiber is kept as 3 mm, high quality fiber grating can be achieved and phase mask can be shielded from wearing.