%0 Journal Article
%T A Fiber Grating Etching Method With Small Tunable Range of Grating Wavelength Employing Phase Mask<br>一种利用相位掩模版对光栅波长进行微调的光栅刻写方法
%A WANG Li
%A CHANG Li-ping
%A CHEN Jia-lin
%A CHEN Bai
%A <br>王利
%A 常丽萍 陈嘉琳 陈柏
%J 光子学报
%D 2008
%I 
%X A fiber grating etching method, which can protect phase mask from abrasion and make the grating wavelength tunable in a small range, has been proposed and demonstrated. A tunable range of 0.48 nm and 2.2 nm in 1 550 nm single-mode fiber and erbium-doped fiber respectively have been demonstrated through tuning the distance between fiber and phase mask. When the distance between phase mask and fiber is kept as 3 mm, high quality fiber grating can be achieved and phase mask can be shielded from wearing.
%K Fiber optics
%K Fiber grating
%K Phase mask
%K Wavelength tuning<br>光纤光学
%K 光纤光栅
%K 相位版
%K 波长调节
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=9F6139E34DAA109F9C104697BF49FC39&aid=5252D53FC5CC0389D51D2379B882425D&yid=67289AFF6305E306&vid=42425781F0B1C26E&iid=38B194292C032A66&sid=30F3EEEA29E34EE7&eid=366B1248A15658C5&journal_id=1004-4213&journal_name=光子学报&referenced_num=0&reference_num=12