STUDY OF THE DIFFUSION OF Zn INTO Ge
Zn在Ge中扩散的研究

In this report the diffusion of Zn into Ge is investigated. The experiments are accomplished in an evacuated and sealed quartz ampoule using Zn as the diffusion source. The xj-t1/2 and C-1/T has been given. The influence of the source temperature on rhe curface micro-graph has been given. It is found that using two-temperature process a smooth surface layer can be obtained.