REMOVING OF THE CARBON CONTAMINATION FROM GaAs, GaP, InP, GaInAs AND GaInPAs SURFACES
GaAs,GaP,InP,GaInAs,GaInPAs晶体表面碳污染的去除

Keywords: Photoemission material,UV/O2,AES surface analysis
光电发射材料,UV/O_3法,AES表面分析

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Abstract:

The different results of removing the carbon contamination with UV/O2 from the GaAs, GaP, InP, GalnAs and GafnPAs surfaces are given.

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