%0 Journal Article
%T REMOVING OF THE CARBON CONTAMINATION FROM GaAs, GaP, InP, GaInAs AND GaInPAs SURFACES<br>GaAs,GaP,InP,GaInAs,GaInPAs晶体表面碳污染的去除
%A Tao Zhaomin
%A Xia Changhong
%A Pan Xiaodan
%A Pan Xia
%A <br>陶兆民
%A 夏长虹
%A 潘晓丹
%A 潘峡
%J 电子与信息学报
%D 1989
%I 
%X The different results of removing the carbon contamination with UV/O2 from the GaAs, GaP, InP, GalnAs and GafnPAs surfaces are given.
%K Photoemission material
%K UV/O2
%K AES surface analysis<br>光电发射材料
%K UV/O_3法
%K AES表面分析
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=EFC0377B03BD8D0EF4BBB548AC5F739A&aid=4450568B8FA83A1B&yid=1833A6AA51F779C1&vid=708DD6B15D2464E8&iid=CA4FD0336C81A37A&sid=D767283A3B658885&eid=4BB057F167CF3A60&journal_id=1009-5896&journal_name=电子与信息学报&referenced_num=0&reference_num=2