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OALib Journal期刊
ISSN: 2333-9721
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A NEW TECHNIQUE FOR THINNING THE THICKNESS OF UNUNIFORM EPILAYERS--SELECTIVE ANODIC OXIDATION
一种新的非均匀减薄法——选择阳极氧化法

Keywords: Semiconductor technology,Thinning technique,Selective anodic xidation
半导体工艺
,减薄技术,选择阳极氧化

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Abstract:

A new technique called selective anodic oxidation, by which the ununiform epilayers can be thinned, is presented. The thickness of n+-layers of GaAs IMPATT diodes with n+-n-n++ structure has been strictly controlled by the use of this technique. This results in the efficiency of IMPATT diodes up to its theoretical value.

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