CHROMELESS PHASE SHIFT MASK PHOTOLITHOGRAPHY
无铬相移掩模光刻技术

In the paper,we describe the basic principles and primary types of phase shift masks (PSM) used for increasing resolution.Manufacturing methods of chromeless PSM are presented. Exposure experiment and experimental results are given.Practical resolution 0.5 m has been gained with g line(436nm)10x reduction stepper of NA 0.28.