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OALib Journal期刊
ISSN: 2333-9721
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REQUIREMENT OF SILICON FLATNESS FOR SILICON DIRECT BONDING TECHNOLOGY
硅直接键合工艺对晶片平整度的要求

Keywords: Bonding technology,Silicon material,Flatness,Double crystal dif- fractometry
键合工艺
,硅材料,平整度,双晶衍射技术

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Abstract:

The influence of silicon slice flatness on bonding technology and the relation between foreign particle and resulting bubble are quantitatively presented by the elastic theory. It is demonstrated experimentally by X ray double crystal dif-fractometry and infrared transmission imager.

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