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Preparation and Characterization of CeO2/YSZ/CeO2 Buffer Layers for YBCO Coated Conductors

Keywords: Buffer,Direct-current magnetron reactive sputtering,Coated conductors,RABiTS
缓冲器
,直接电流磁控管电抗性溅射,涂层导体,在非织构金属基底上生长缓冲层和超导层

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Abstract:

CeO2 seed layer was deposited on rolling-assisted biaxially textured metal substrates by direct-current (DC) magnetron reactive sputtering. The effect of deposition temperature on epitaxial orientation of CeO2 thin films was examined. High quality CeO2 layers were achieved at deposition temperature from 750℃ to 850℃.Subsequently yttria-stabilized zirconia (YSZ) and CeO2 films were deposited to complete the buffer layer structure via the same process. The best samples exhibited a highly biaxial texture, as indicated by FWHM (full width half maximum) values in the range of 4°-5°, and 2°-4° for in-plane and out-of-plane orientations,respectively. Secondary ion mass spectrometer analysis confirmed the effective prevention of buffer layer against Ni and W metal interdiffusion. Atomic force microscope observations revealed a smooth, dense and crack-free surface morphology, which provided themselves as the good buffer structure to the YBa2Cu3O7-δ(YBCO) coated conductors.

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