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OALib Journal期刊
ISSN: 2333-9721
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Capacitance of High-Voltage Coaxial Cable in Plasma Immersion Ion Implantation

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Abstract:

Plasma immersion ion implantation (PIII) is an excellent technique for the surf see modification of complex-shaped components. Owing to pulsed operation mode of the high voltage and large slew rate, the capacitance on the high-voltage coaxial cable can be detrimental to the process and cannot be ignored. In fact, a significant portion of the rise-time/fall-time of the implantation voltage pulse and big initial current can be attributed to the coaxial cable.

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