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材料研究学报 1997
A NEW FABRICATION METHOD OF HIGH MELTING POINT METAL COATING
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Abstract:
A new multiple hollow cathode sputtering target, which has a simple structure and a high sputtering rate,was put forward. The sputtering rate can be controlled by changing target voltage, pressure and H. D-1. The result shows that this method has a high deposition rate and the coating has a high binding strength.This method is suitable for many metals or thier alloys as the target and extensively for high-melting point metals or their alloys.
