%0 Journal Article
%T A NEW FABRICATION METHOD OF HIGH MELTING POINT METAL COATING<br>一种高熔点金属涂层的制备方法
%A TANG Bin
%A HE Jiawen
%A WANG Congzen
%A XU Zhong
%A <br>唐宾
%A 何家文
%A 王从曾
%A 徐重
%J 材料研究学报
%D 1997
%I 
%X A new multiple hollow cathode sputtering target, which has a simple structure and a high sputtering rate,was put forward. The sputtering rate can be controlled by changing target voltage, pressure and H. D-1. The result shows that this method has a high deposition rate and the coating has a high binding strength.This method is suitable for many metals or thier alloys as the target and extensively for high-melting point metals or their alloys.
%K hollow cathode sputtering coating<br>空心阴极
%K 溅射
%K 镀膜
%K 金属涂层
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=C101C4C04993B4D94FCD8446E6CBEB3B&aid=58849E4E869FEBFF&yid=5370399DC954B911&vid=708DD6B15D2464E8&iid=0B39A22176CE99FB&sid=38685BC770C663F2&eid=9F6DA927E843CD50&journal_id=1005-3093&journal_name=材料研究学报&referenced_num=0&reference_num=2