THE INITIAL STAGE OF ION BEAM DEPOSITING Ti AND Ni FILM GROWTH
离子束溅射Ti和Ni薄膜的初生过程

The initial stage of ion beam sputtered Ni and Ti film has been investigated in situ using AES .The results show that the film growth model of Ti and Ni films sputtered on Si single crystal (100) surface are FM model i.e layer by layer growth model. The film growth rate depends on the sputtering yield.