%0 Journal Article
%T THE INITIAL STAGE OF ION BEAM DEPOSITING Ti AND Ni FILM GROWTH<br>离子束溅射Ti和Ni薄膜的初生过程
%A YANG Chunsheng
%A ZHOU Di
%A QI Zhenzhong
%A ZHANG Shoubo
%A CAI Bingchu
%A <br>杨春生
%A 周狄
%A 威震中
%A 张寿柏
%A 蔡丙初
%J 材料研究学报
%D 1996
%I 
%X The initial stage of ion beam sputtered Ni and Ti film has been investigated in situ using AES .The results show that the film growth model of Ti and Ni films sputtered on Si single crystal (100) surface are FM model i.e layer by layer growth model. The film growth rate depends on the sputtering yield.
%K initial stage of film growth
%K layer growth model<br>薄膜初生过程
%K 层状生长模式
%K 离子束溅射
%K 钛
%K 镍
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=C101C4C04993B4D94FCD8446E6CBEB3B&aid=64C93EE29799B62A&yid=8A15F8B0AA0E5323&vid=F3090AE9B60B7ED1&iid=94C357A881DFC066&sid=3F419E61BD389CC8&eid=C4490A71BEB872FA&journal_id=1005-3093&journal_name=材料研究学报&referenced_num=0&reference_num=4