C- V CHARACTERISTICS OF MIS STRUCTURES WITH LANGMURI-BLODGETT POLYIMIDE FILMS
聚酰亚胺LB膜MIS结构C—V特性

C-V technology is an effective method of studing semiconductor interfaCe. This paper will rePort some interesting new results of C-V characteristics which are obtained from MIS tunnel junction with LB insulting films.The substrates used in present resear