PROPERTIES OF SURFACE AND WHISKER-LIKE MICROSTRUCTURES OF AMORPHOUS SILICON
非晶硅薄膜表面与非晶须特性

The surface,the interface and the microstructures of the undoped hydrogenated amorphoussilicon films by RF plasma chemical vapor deposition are investigated.The whisker-like microstructures(amorphous silicon whisker)are observed by transmission electron microscope(TEM).The X-rayphotoelectron spectroscopy(XPS)analysis shows that the SiO_2/SiO_x/a-Si structure in the interface be-tween SiO_2 and amorphous silicon are formed at room temperature.The chemical composition of the tran-sition region of the interface in the SiO_2/a-Si are SiO_x(0