%0 Journal Article
%T PROPERTIES OF SURFACE AND WHISKER-LIKE MICROSTRUCTURES OF AMORPHOUS SILICON<br>非晶硅薄膜表面与非晶须特性
%A LIN Hongyi
%A <br>林鸿溢
%J 材料研究学报
%D 1990
%I 
%X The surface,the interface and the microstructures of the undoped hydrogenated amorphoussilicon films by RF plasma chemical vapor deposition are investigated.The whisker-like microstructures(amorphous silicon whisker)are observed by transmission electron microscope(TEM).The X-rayphotoelectron spectroscopy(XPS)analysis shows that the SiO_2/SiO_x/a-Si structure in the interface be-tween SiO_2 and amorphous silicon are formed at room temperature.The chemical composition of the tran-sition region of the interface in the SiO_2/a-Si are SiO_x(0
%K amorphous silicon
%K film
%K surface
%K interface
%K amorphous silicon whisker
%K microstructure<br>非晶态硅
%K 薄膜
%K 表面
%K 界面
%K 非晶须
%K 微结构
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=C101C4C04993B4D94FCD8446E6CBEB3B&aid=7035BA653C3C5420&yid=8D39DA2CB9F38FD0&vid=E158A972A605785F&iid=38B194292C032A66&sid=9F8C5EF901EA1E7E&eid=44A4891E33BFF455&journal_id=1005-3093&journal_name=材料研究学报&referenced_num=0&reference_num=1