GROWTH OF DIAMOND FILMS BY LOWER PRESSURE PHASE
低压气相生长金刚石薄膜

Vacuum evaporating device which was designed by us is used to grow dia-mond films on the substrate of silicon single crystals from a mixture of CH_4 and H_2 gasesat lower pressure by hot-filament CVD method.The results of X-ray diffraction,Ramanspectrum and SEM analysis show that the films present polycrystalline diamond strueture,the process of the films growth is stable and the repeatability of results is excellent.Mecha-nism of growth of diamond films are also investigated.