%0 Journal Article
%T GROWTH OF DIAMOND FILMS BY LOWER PRESSURE PHASE<br>低压气相生长金刚石薄膜
%A ZHANG Baojun
%A HUANG Suiyang
%A CANG Fengbo
%A CHANG Jingyi
%A <br>张保军
%A 黄穗阳
%A 苍风波
%A 常静宜
%J 材料研究学报
%D 1990
%I 
%X Vacuum evaporating device which was designed by us is used to grow dia-mond films on the substrate of silicon single crystals from a mixture of CH_4 and H_2 gasesat lower pressure by hot-filament CVD method.The results of X-ray diffraction,Ramanspectrum and SEM analysis show that the films present polycrystalline diamond strueture,the process of the films growth is stable and the repeatability of results is excellent.Mecha-nism of growth of diamond films are also investigated.
%K hot-filament chemical vapour deposition
%K diamond film
%K growth by lower pressure phase<br>热丝化学气相沉积
%K 金刚石薄膜
%K 低压气相合成
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=C101C4C04993B4D94FCD8446E6CBEB3B&aid=5ADC89C1CC036D6E&yid=8D39DA2CB9F38FD0&vid=E158A972A605785F&iid=38B194292C032A66&sid=1A363081E1FF7014&eid=4E6F5C60B72D9B1C&journal_id=1005-3093&journal_name=材料研究学报&referenced_num=0&reference_num=1