DEPOSITION OF DIAMOND FILM ON Si_3N_4 AND SAILON CERAMICS
氮化硅及Sialon陶瓷基材上金刚石膜的沉积

In this paper,diamond film had been synthesized on Si_3N_4+SiC composite ce-ramics and sialon ceramics by HFCVD(hot filament chemical vapor deposition).The obtaindfilms were analysized by X-ray diffraction,Raman spectrometer,scanning electron microscopy,profilograph and scratch tester.The adhesion of the film was measured and the effective actor ofthe adhesion between the film and substrate was tentativly studied.