%0 Journal Article
%T DEPOSITION OF DIAMOND FILM ON Si_3N_4 AND SAILON CERAMICS<br>氮化硅及Sialon陶瓷基材上金刚石膜的沉积
%A CHEN Yan
%A HUANG Rongfang
%A WEN Lishi
%A SHI Changxu
%A <br>陈岩
%A 黄荣芳
%A 闻立时
%A 师昌绪
%J 材料研究学报
%D 1992
%I 
%X In this paper,diamond film had been synthesized on Si_3N_4+SiC composite ce-ramics and sialon ceramics by HFCVD(hot filament chemical vapor deposition).The obtaindfilms were analysized by X-ray diffraction,Raman spectrometer,scanning electron microscopy,profilograph and scratch tester.The adhesion of the film was measured and the effective actor ofthe adhesion between the film and substrate was tentativly studied.
%K HFCVD
%K diamond film
%K thermal expand coeffcient<br>热丝CVD
%K 金刚石薄膜
%K 热膨胀系数
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=C101C4C04993B4D94FCD8446E6CBEB3B&aid=F7DE0E027F006E76&yid=F53A2717BDB04D52&vid=B31275AF3241DB2D&iid=CA4FD0336C81A37A&sid=014B591DF029732F&eid=6AC2A205FBB0EF23&journal_id=1005-3093&journal_name=材料研究学报&referenced_num=0&reference_num=1