CHARACTERIZATION OF DLC FILMS PREPARED BY DUAL-ION BEAM SPUTTERING DEPOSITION
双束溅射淀积DLC膜的结构表征和性能分析

Using dual-ion beam sputtering deposition method,DLC films were depositedon glass and silicon substrate under different CH_4 flow ratios(CH_4/(CH_4+Ar)from 0% to100%)in bombarding ion source.The structures and the properties of the films were systemati-cally analyzed.It showed that the structures,the morphological characteristics and the proper-ties of the films were strongly influenced by the CH_4 flow ratios.The formation mechanism ofDLC films were investigated.