%0 Journal Article
%T CHARACTERIZATION OF DLC FILMS PREPARED BY DUAL-ION BEAM SPUTTERING DEPOSITION<br>双束溅射淀积DLC膜的结构表征和性能分析
%A WANG Weijie
%A WANG Tianmin
%A HAN PeigangLUO Chongtai
%A HUANG Liangfu
%A LIU Dingquan
%A <br>王维洁
%A 王天民
%A 韩培刚
%A 罗崇泰
%A 黄良甫
%A 刘定权
%J 材料研究学报
%D 1992
%I 
%X Using dual-ion beam sputtering deposition method,DLC films were depositedon glass and silicon substrate under different CH_4 flow ratios(CH_4/(CH_4+Ar)from 0% to100%)in bombarding ion source.The structures and the properties of the films were systemati-cally analyzed.It showed that the structures,the morphological characteristics and the proper-ties of the films were strongly influenced by the CH_4 flow ratios.The formation mechanism ofDLC films were investigated.
%K Dual-ion beam sputtering deposition
%K DLC films
%K thin film growth
%K structure
%K properties<br>双离子束溅射淀积
%K DLC膜
%K 薄膜生长
%K 结构
%K 性能
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=C101C4C04993B4D94FCD8446E6CBEB3B&aid=D63E689617F9D811&yid=F53A2717BDB04D52&vid=B31275AF3241DB2D&iid=E158A972A605785F&sid=0C3F9E980968AF79&eid=160561E9A96393DE&journal_id=1005-3093&journal_name=材料研究学报&referenced_num=0&reference_num=1