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材料研究学报 1993
PHASE STRUCTURE AND STABILITY OF ZIRCONIA THIN FILMS
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Abstract:
Zirconia thin films were deposited by r.f.magnetron reactive sputtering methodwith the pure metal Zr,compound Y-ZrO_2 and Mg-ZrO_2 targets.The phase structures of thethree series films were investigated,and the effect of annealing and stressing were studied too.The studies show that ZrO_2 thin films have monoclinic and Y-ZrO_2 and Mg-ZrO_2 thin filmshave tetragonal and monoclinic,but tetragonal is major phase;The three kinds of thin films ap-pear different phase transformation behaviour during anealing.And polishing and grinding theY-ZrO_2 thin films,their tetragonal phase could not be trasformed into monoclinic phase.