%0 Journal Article
%T PHASE STRUCTURE AND STABILITY OF ZIRCONIA THIN FILMS
ZrO_2薄膜的相结构与相稳定性
%A WANG Yinghua LI Xiaoping
%A
王英华
%A 李晓萍
%J 材料研究学报
%D 1993
%I
%X Zirconia thin films were deposited by r.f.magnetron reactive sputtering methodwith the pure metal Zr,compound Y-ZrO_2 and Mg-ZrO_2 targets.The phase structures of thethree series films were investigated,and the effect of annealing and stressing were studied too.The studies show that ZrO_2 thin films have monoclinic and Y-ZrO_2 and Mg-ZrO_2 thin filmshave tetragonal and monoclinic,but tetragonal is major phase;The three kinds of thin films ap-pear different phase transformation behaviour during anealing.And polishing and grinding theY-ZrO_2 thin films,their tetragonal phase could not be trasformed into monoclinic phase.
%K zirconia films
%K phase structure
%K thin films
ZrO_2薄膜
%K 相结构
%K 薄膜
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=C101C4C04993B4D94FCD8446E6CBEB3B&aid=ECDA69BC9602AF46&yid=D418FDC97F7C2EBA&vid=DF92D298D3FF1E6E&iid=38B194292C032A66&sid=D9AE183D3F5C3C75&eid=1DF3F9D75A12D97B&journal_id=1005-3093&journal_name=材料研究学报&referenced_num=0&reference_num=1