TEM STUDY ON CROSS SECTION STRUCTURE OF Ti-N FILM BY MIB
多离子束沉积Ti-N膜横截面组织的电镜研究

In this paper the results of TEM study on cross section structure of Ti-N filmsby MIB are reported.There are five layers from the substrate of W18Cr4V to the top of the film:Fe-Ti amorphous alloy about 20nm,tier Ti_2N,fibre Ti_2N,fibre Ti_2N+TiN and thin columnarTiN.The substrate grains of W18Cr4V become finer.A mixing zone of Ti-N-Fe as well as W,V,Cr exists in about 100nm depth.The formative mechanism and the effect on properties of thefilm are discussed.