%0 Journal Article
%T TEM STUDY ON CROSS SECTION STRUCTURE OF Ti-N FILM BY MIB<br>多离子束沉积Ti-N膜横截面组织的电镜研究
%A WAN Lijun
%A HEI Zukun
%A <br>万立骏
%A 黑祖昆
%A 高路斯
%A 陈宝清
%J 材料研究学报
%D 1992
%I 
%X In this paper the results of TEM study on cross section structure of Ti-N filmsby MIB are reported.There are five layers from the substrate of W18Cr4V to the top of the film:Fe-Ti amorphous alloy about 20nm,tier Ti_2N,fibre Ti_2N,fibre Ti_2N+TiN and thin columnarTiN.The substrate grains of W18Cr4V become finer.A mixing zone of Ti-N-Fe as well as W,V,Cr exists in about 100nm depth.The formative mechanism and the effect on properties of thefilm are discussed.
%K multiple ion beam mixing
%K cross section structure of film
%K Fe-Ti amorphous alloy
%K Ti_2N
%K TiN<br>多离子束混合
%K 镀膜的横截面组织
%K Fe-Ti非晶
%K Ti_2N
%K TiN
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=C101C4C04993B4D94FCD8446E6CBEB3B&aid=92060E5EEAE87F4A&yid=F53A2717BDB04D52&vid=B31275AF3241DB2D&iid=38B194292C032A66&sid=6A73B36E85DB0CE9&eid=5B5B75F4854B8331&journal_id=1005-3093&journal_name=材料研究学报&referenced_num=1&reference_num=1