全部 标题 作者
关键词 摘要

OALib Journal期刊
ISSN: 2333-9721
费用:99美元

查看量下载量

相关文章

更多...

Dynamical Analysis of Sputtering at Threshold Energy Range: Modelling of Ar+Ni(100) Collision System
Dynamical Analysis of Sputtering at Threshold Energy Range: Modelling of Ar+Ni(100) Collision System

Keywords: 79,20,Rf,02,70,Ns,71,18,Bn,82,20,Wt,68,35,-p,61,82,Bg
反应溅射法
,分子动力学,能限,氩镍碰撞系统

Full-Text   Cite this paper   Add to My Lib

Abstract:

The sputtering process of Ar+Ni(100) collision systems is investigated by means of constant energy molecular dynamics simulations. The Ni(100) slab is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using the reparametrized ZBLpotential. Ni atom emission from the lattice is analysed over the range of 20--50eV collision energy. Sputtering yield, angular and energy distributions of the scattered Ar and of the sputtered Ni atoms are calculated, and compared to the available theoretical andexperimental data.

Full-Text

Contact Us

service@oalib.com

QQ:3279437679

WhatsApp +8615387084133