%0 Journal Article
%T Dynamical Analysis of Sputtering at Threshold Energy Range: Modelling of Ar+Ni(100) Collision System
Dynamical Analysis of Sputtering at Threshold Energy Range: Modelling of Ar+Ni(100) Collision System
%A HUNDUR Yakup
%A GUVENC Ziya B
%A HIPPLER Rainer
%A
%J 中国物理快报
%D 2008
%I
%X The sputtering process of Ar+Ni(100) collision systems is investigated by means of constant energy molecular dynamics simulations. The Ni(100) slab is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using the reparametrized ZBLpotential. Ni atom emission from the lattice is analysed over the range of 20--50eV collision energy. Sputtering yield, angular and energy distributions of the scattered Ar and of the sputtered Ni atoms are calculated, and compared to the available theoretical andexperimental data.
%K 79
%K 20
%K Rf
%K 02
%K 70
%K Ns
%K 71
%K 18
%K Bn
%K 82
%K 20
%K Wt
%K 68
%K 35
%K -p
%K 61
%K 82
%K Bg
反应溅射法
%K 分子动力学
%K 能限
%K 氩镍碰撞系统
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=E27DA92E19FE279A273627875A70D74D&aid=FA7B1AF9A1D5DA03657CAFDC44643E25&yid=67289AFF6305E306&vid=C5154311167311FE&iid=0B39A22176CE99FB&sid=245EE63BFE8F8B66&eid=EED44B83FAB71309&journal_id=0256-307X&journal_name=中国物理快报&referenced_num=0&reference_num=0