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材料研究学报 1992
DEPOSITION OF TiN ON INSULATOR ALUNDUM BY DC-PCVD INSTRUMENT
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Abstract:
The thin film TiN that has been deposited on the insulation alundum by DCplasma chemical deposition(DC-PCVD)instrument has a strong adhesion to the substrate.The forming mechanism of thin film TiN and effect factor of the film quality have been dis-cussed.
