%0 Journal Article
%T DEPOSITION OF TiN ON INSULATOR ALUNDUM BY DC-PCVD INSTRUMENT<br>用DC-PCVD装置在绝缘体蓝宝石上沉积TiN
%A YANG Chuan
%A WU Daxing
%A GAO Guoqing
%A <br>杨川
%A 吴大兴
%A 高国庆
%J 材料研究学报
%D 1992
%I 
%X The thin film TiN that has been deposited on the insulation alundum by DCplasma chemical deposition(DC-PCVD)instrument has a strong adhesion to the substrate.The forming mechanism of thin film TiN and effect factor of the film quality have been dis-cussed.
%K DC-PCVD
%K alundum
%K deposition<br>DC-PCVD
%K 蓝宝石
%K 沉积
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=C101C4C04993B4D94FCD8446E6CBEB3B&aid=352884E5539698D3&yid=F53A2717BDB04D52&vid=B31275AF3241DB2D&iid=CA4FD0336C81A37A&sid=BFE7933E5EEA150D&eid=E84BBBDDD74F497C&journal_id=1005-3093&journal_name=材料研究学报&referenced_num=0&reference_num=1