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ISSN: 2333-9721
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Particular electrical quality of a-plane GaN films grown on r-plane sapphire by metal-organic chemical vapor deposition
用MOCVD在r面蓝宝石衬底上生长的a面GaN的独特电学性质研究

Keywords: GaN,anisotropic,HRXRD,nonpolar
氮化镓
,各向异性,高分辨X射线衍射,非极性

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Abstract:

Nonpolar (1120) a-plane GaN films have been grown by low-pressure metal-organic vapor deposition on r-plane (1102) sapphire substrate. The structural and electrical properties of the a-plane GaN films are investigated by high-resolution X-ray diffraction (HRXRD), atomic force microscopy (AFM) and van der Pauw Hall measurement. It is found that the Hall voltage shows more anisotropy than that of the c-plane samples; furthermore, the mobility changes with the degree of the van der Pauw square diagonal to the c direction, which shows significant electrical anisotropy. Further research indicates that electron mobility is strongly influenced by edge dislocations.

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