Fabrication of Optical Waveguide Devices with UV-Writing Technology
紫外写入技术制备光波导器件研究

The photosensitivity of commercial Si/SiO2 waveguide materials prepared by PECVD is studied.After exposure to high-pressure hydrogen,the as-deposited films are irradiated with excimer-laser pulses operating at 248nm.The change in the induced relative refractive index is about 0.34%.The sectional index distribution of UV-writing waveguides is investigated in detail.Finally,single-mode optical waveguides and Y-splitters are fabricated from silica-based planar optical waveguides with UV-writing technology with a silicon mask.The test results agree with the simulation results.