%0 Journal Article
%T Fabrication of Optical Waveguide Devices with UV-Writing Technology<br>紫外写入技术制备光波导器件研究
%A Wu Yuand
%A Xia Junlei
%A An Junming
%A Li Jianguang
%A Wang Hongjie
%A Hu Xiongwei
%A <br>吴远大
%A 夏君磊
%A 安俊明
%A 李建光
%A 王红杰
%A 胡雄伟
%J 半导体学报
%D 2006
%I 
%X The photosensitivity of commercial Si/SiO2 waveguide materials prepared by PECVD is studied.After exposure to high-pressure hydrogen,the as-deposited films are irradiated with excimer-laser pulses operating at 248nm.The change in the induced relative refractive index is about 0.34%.The sectional index distribution of UV-writing waveguides is investigated in detail.Finally,single-mode optical waveguides and Y-splitters are fabricated from silica-based planar optical waveguides with UV-writing technology with a silicon mask.The test results agree with the simulation results.
%K UV-writing
%K refractive index
%K optical waveguide
%K optical splitter<br>紫外写入
%K 折射率
%K 光波导
%K 分束器
%K 写入技术
%K 光波导器件
%K 研究
%K Technology
%K Devices
%K Optical
%K Waveguide
%K 模拟结果
%K 实测结果
%K 光现象
%K 观测
%K 分束器
%K 单模波导
%K 芯层
%K 紫外写入法
%K 分布情况
%K 方向
%K 深度
%K 样品
%K 紫外光诱导
%K 相对值
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=D3C6D85099FF1ABD&yid=37904DC365DD7266&vid=DB817633AA4F79B9&iid=E158A972A605785F&sid=195767709E606C85&eid=4C49EFA0A53C9DF0&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=8