Simulation of the Diffraction Effect in Exposure on a SU-8 Photoresist and the Glycerol Compensated Method
SU-8胶曝光衍射效应的模拟及丙三醇补偿方法

According to a Fresnel diffraction model,and considering the reflection and refraction at the glycerol/SU-8 interface,this paper simulates the aerial image when glycerol is applied between the photomask and resist.Compared to the experimental results,the model can describe the lithography process competently and be applied in design.