%0 Journal Article
%T Simulation of the Diffraction Effect in Exposure on a SU-8 Photoresist and the Glycerol Compensated Method<br>SU-8胶曝光衍射效应的模拟及丙三醇补偿方法
%A Zhu Zhen
%A Huang Qing''''an
%A Li Weihua
%A Zhou Zaifa
%A Feng Ming
%A <br>朱真
%A 黄庆安
%A 李伟华
%A 周再发
%A 冯明
%J 半导体学报
%D 2007
%I 
%X According to a Fresnel diffraction model,and considering the reflection and refraction at the glycerol/SU-8 interface,this paper simulates the aerial image when glycerol is applied between the photomask and resist.Compared to the experimental results,the model can describe the lithography process competently and be applied in design.
%K SU-8 photoresist
%K Fresnel diffraction
%K glycerol<br>SU-8胶
%K 菲涅耳衍射
%K 丙三醇
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=868627F82EA25FF979F0BF9F409738DE&yid=A732AF04DDA03BB3&vid=D3E34374A0D77D7F&iid=59906B3B2830C2C5&sid=9377ED8094509821&eid=FA004A8A4ED1540B&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=12