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OALib Journal期刊
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Two-dimensional pixel image lag simulation and optimization in a 4-T CMOS image sensor
四管CMOS图像传感器中像素图像拖影的二维仿真与优化

Keywords: image lag,two-dimensional simulation,doping dose,implant tilt,CMOS image sensor
图像拖影
,二维仿真,掺杂剂量,注入角度,CMOS图像传感器

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Abstract:

Pixel image lag in a 4-T CMOS image sensor is analyzed and simulated in a two-dimensional model. Strategies of reducing image lag are discussed from transfer gate channel threshold voltage doping adjustment, PPD N-type doping dose/implant tilt adjustment and transfer gate operation voltage adjustment for signal electron transfer. With the computer analysis tool ISE-TCAD, simulation results show that minimum image lag can be obtained at a pinned photodiode n-type doping dose of 7.0 × 1012 cm–2, an implant tilt of –2o, a transfer gate channel doping dose of 3.0 × 1012 cm-2 and an operation voltage of 3.4 V. The conclusions of this theoretical analysis can be a guideline for pixel design to improve the performance of 4-T CMOS image sensors.

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