(NH4)2S treatment of the Si (100) surface and its effects on Al/Si Schottky barrier heights
Si (100) 表面 (NH4)2S 处理及其对Al/Si肖特基势垒的影响

The effect of Si (100) surface S passivation was investigated. A thick film with a high roughness value was formed on the Si surface treated by (NH4)2S solution, which was attributed to physical adsorption of S atoms. SEM and XPS analyses reveal that Si s