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OALib Journal期刊
ISSN: 2333-9721
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Dependence of Inversion Layer Thickness on Film Thickness in Thin-Film SOI Structures
薄膜SOI结构中反型层厚度与薄膜厚度的关系

Keywords: Semiconductor device and Material,MOS structure,Field-effect transistors,design
薄膜
,SOI,反型层厚度,薄膜厚度

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Abstract:

The dependence of inversion layer thickness on film thickness in thin-film SOI structureis analysed theoretically by using computer simulation. A new concept and parameter, the criticalthickness of thin film all-bulk inversion, are introduced for the design of thin-film MOS)SOI devices. It is necessary to select the film thickness near to the all-bulk strong inversion criticalthicknesss in order to get high speed and high power working of ultrathin film MOS/SOIdevices.

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