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半导体学报 2010
Fluid model of inductively coupled plasma etcher based on COMSOL
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Abstract:
Fluid dynamic models are generally appropriate for the investigation of inductively coupled plasmas.A commercial ICP etcher filled with argon plasma is simulated in this study.The simulation is based on a multiphysical software,COMSOL~(TM),which is a partial differential equation solver.Just as with other plasma fluid models,there are drift-diffusion approximations for ions,the quasi-neutrality assumption for electrons movements,reduced Maxwell equations for electromagnetic fields,electron energy equations ...