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OALib Journal期刊
ISSN: 2333-9721
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Bandgap Narrowing of Strained Si1-xGex as a Function of Ge Fraction,Temperature and Impurity Concentration
温度、Ge含量和掺杂浓度对Si_(1-x)Ge_x禁带宽度的影响

Keywords: SiGe base material,bandgap narrowing,Fermi level,degenerate semiconductor
锗硅材料
,禁带变窄量,费米能级,简并半导体

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Abstract:

An empirical method is proposed for determining the total bandgap narrowing in the base of a SiGe HBT,which is a function of temperature,impurity concentration and germanium fraction.Calculated values have been obtained for a wide range of boron base doping concentrations at different temperatures.The results are very comparable with the theoretical and experimental results given by the literature.

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